photolithography是什么意思   photolithography怎么读

photolithography单词基本解析：

photolithography变化用词：

photolithography英英释义：

1. a planographic printing process using plates made from a photographic image

名词 photolithography:

a planographic printing process using plates made from a photographic imagephotolithography[ ,fəutəli'θɔɡrəfi ]n.a planographic printing process using plates made from a photographic image

photolithography中文词源：

photolithography用法和例句：

The patterned anodic aluminum oxide ( AAO ) template was fabricated by UV photolithography.

采用紫外光刻法制得图案化的阳极 氧化铝 模板.

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With 300 lines of Photolithography and screen resolution, with cyberctm indosinian.

如果采用300线网屏的特技照相制版,就可获得有动感的印成品了.

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Alignment Precision - Displacement of patterns that occurs during the photolithography process.

套准精度 - 在光刻工艺中转移图形的精度.

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Atom photolithography is a new application of atom optics in microfabrication technical field.

原子光刻是原子光学在微细加工技术领域的新应用.

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In Fig . 3 B, avidin protein was printed by photolithography onto a biotinylated PSI surface.

三号乙, 抗生物素蛋白印刷光刻到生物防扩散表面.

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photolithography

Photoresists or anti reflective coating for photolithography process;

黃光微影製程使用的光刻膠和抗反射塗層；

BARC Process Used for Sub-micrometer Photolithography

BARC工艺在亚微米光刻中的应用

Both CRTs and LCDs achieve such precision with photolithography, in which a projected light image creates a pattern for laying out a material design.

CRT以及LCD采用光刻技术来做到这点，这种方法利用投射的光学影像来配置材料设计的图案。

In Fig. 3B, avidin protein was printed by photolithography onto a biotinylated PSI surface.

三号乙，抗生物素蛋白印刷光刻到生物防扩散表面。

relaxed registration photolithography

不严格对准光刻

Experts think, according to the rule of physics, make more careful microprocessor technology will be at the beginning of next centuries with current photolithography technology develop acme.

专家们认为,根据物理学的规律,用目前的照相平版工艺制造更精细的微处理器技术将在下世纪初发展到顶点。

To create intricate patterns of many different types of bacteria, Weibel borrowed a technique from the computer chip industry called photolithography.

为了精细地制造各种不同的细菌排列，Weibel借用了计算机芯片制造中的微影技术。

Why not use photolithography to make nanostructures?

为什麽不使用光蚀刻法制造奈米结构？

How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced.

介绍了如何通过测量得出的等效扩散长度和光刻机的照明条件来对任何光刻工艺的线宽均匀性进行评估。

But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller, manufacturers are exploring alternative technologies for making future nanochips.

但由于结构变得更小后，传统的光蚀刻法变得更难做，因此业者正在找寻其他技术，以做出未来的奈米晶片。

Photolithography: forming electrodes in the form required on the ITO film.

光刻:在ITO表面形成要求形状的电极。

Keywords Micro &nano-pattern;photolithography;reaction-induced phase separation;

光刻;反应性相分离;微纳米图形;

photolithography area

光刻区

photolithography area dispatching

光刻区调度

photolithography technique

光刻工艺

Photolithography shutter

光刻快门

Keywords Photolithography;Digital Mask;DMD;Grayscale;Microlens;Enzyme Etching;

光刻技术;数字掩模;数字微镜装置;灰度;微透镜;酶刻蚀;

photolithography limitation

光刻极限

photolithography simulation

光刻模拟

photolithography photoetching method

光刻法

photolithography mask

光刻版

Optical proximity correction for improving pattern quality in submicron photolithography

光学邻近校正改善亚微米光刻图形质量

photolithography array

光版印制阵列

Experimental Study on Pupil Filtering Projection Photolithography

光瞳滤波投影光刻实验研究

Fabrication process of the sensor is introduced, especially the double alignment in the photolithography.

分析了比较信号平均效应对两种膜型的影响。

Application of Semiconductor Photolithography in Biochip Fabrication

半导体光刻技术在生物芯片制作中的应用

Introduction to semi-conductor 2. Manufacturing technique of wafer disc 3. Thermal process and photolithography 4. Plasma and ion implantation 5. Etching process

半导体导论2.晶圆制造3.加热及微影制程4.电浆与离子布植5.蚀刻制程

The Status of Photolithography Development at Huahong NEC in a Cleanroom Environment and HHNEC's View on the Process Easiness for 0.13 um, 0.09 um, and 0.065 um Gate Photolithography

华虹NEC洁净室环境中的光刻技术研发现状以及华虹对0.13微米、0.09微米、和0.065微米门电路光刻难易程度的观点.

single step photolithography

单步光刻

Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography

原子光刻用超高真空蒸发设备的设计和建立

Various technical improvements have made it possible to push the limits of photolithography.

各种技术若能改进，便可推进光蚀刻法的极限。

Alignment Precision - Displacement of patterns that occurs during the photolithography process.

套准精度-在光刻工艺中转移图形的精度。

With 300 lines of Photolithography and screen resolution, with cyberctm indosinian.

如果拔取300线网屏的特技拍照制版，不离可得回有动感的印不败品了。

The experiments show that the diffraction error can be eliminated with lens array photolithography method and high-quality grating can be developed.

实验表明透镜阵列光刻法，可以较好的消除衍射误差，研制出高质量的光栅。

Analysis of nanometrology and atom photolithography[J].

引用该论文 张文涛,李同保.

The develop of Fourier storage photolithography system[J].

引用该论文 浦东林,陈林森,解剑锋,沈雁.

Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography[J].

引用该论文 郭小伟,杜惊雷,陈铭勇,杜春雷.

projection photolithography

投影光刻法

Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography

振幅分割无掩模激光干涉光刻的实现方法

contact photolithography

接触光蚀刻

Research of Mask Division for Improving the Edge Sharpness of Photolithography

掩模分形提高光刻边缘锐度的研究

The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.

摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。

In integrated circuits, the defects associated with photolithography are assumed to be the shape of circular discs in order to perform the estimation of yield and fault analysis.

摘要现有成品率及关键面积估计模型中，假定缺陷轮廓为圆，而70%的实际缺陷轮廓接近于椭圆。

Digital photolithography

数字光刻

screenless photolithography

无网照相平印

The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.

最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。

Several data recording methods of WMOC ROM are experimentally explored including the laser direct writing, photolithography and mould stamping.

根据模压法提出了两种波导多层只读光卡制作工艺：软刻印法和边缘粘合法。

Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography.

模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。

step-and-scan photolithography

步进扫描光刻机

Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography

波前分割无掩模激光干涉光刻的实现方法

Premium Wafer - A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.

测试晶圆片-影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶圆片。

Premium Wafer- A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.

测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。

Design and Development of Control Circuit of Liquid Crystal Light Valve Arrays as Photolithography Shutter

液晶光阀组式光刻快门控制电路的研究与设计

laser photolithography

激光光刻

laser direct writing photolithography

激光直写光刻

A picture made by photolithography.

照相平版印刷品由照相平版术制成的照片

One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.

用于做克服这问题的独块巨石的集成电路的过程之一是基于光致抗蚀剂的照相平版印刷。

The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.

用光学传递函数方法说明了透镜阵列消除光刻中衍射误差的原理。

Because these forms of radiation have much shorter wavelengths than the ultraviolet light currently used in photolithography, they minimize the blurring caused by diffraction.

由于这类型辐射的波长远较现在光蚀刻使用的紫外光来得短，因此可以减少因绕射而造成的模糊。

Electron beam lithography lays down circuit patterns more slowly than photolithography does, because it generates patterns serially instead of in parallel.

电子束微影制程布设电路图样时，比光刻技术慢，因为它是以循序而非平行方式产生图样。

Effect of distortion of mask on photolithography pattern quality

畸变的掩模对光刻图形质量的影响

Keywords Silicon;Silica;Etching rate;Photolithography;

硅;二氧化硅;腐蚀速率;光刻术;

precision photolithography

精密光刻

ultraviolet radiation photolithography

紫外光刻

Keywords nanotechnology;development trend;photolithography;chip;

纳米技术;发展趋势;光刻印刷芯片;

Keywords nanometrology;transfer standard;atom photolithography;

纳米计量;纳米传递;原子光刻;

The parylene anchor with very deep semi sphere recess is fabricated utilizing the dry film photolithography technique.

聚对二甲基苯固定器拥有一个非常深的半圆形沟槽，这是运用乾式薄膜光阻的技术制作而成。

Auto-controlled Liquid Crystal Light Valve Arrays as Photolithography Shutter

自控液晶光阀组式光刻快门研究

A process called photolithography defines the ion-activated regions with patterns of light and acid etching to make transistors [see illustration on page 55].

若想在晶圆上挤入更多的电晶体，就必须选择波长更短的光束。

Adapting rolled-carbon chicken wire to the standard photolithography and etching process that patterns and removes material to form electrical circuitry proved just as daunting.

要将捲缩的碳网制作成电路，光刻和蚀刻制程已经证实是困难重重。

Let modern ultra high precision (optical resolution 5000DPI above) scanner or Photolithography can no longer reproduce maintop pattern lines can control scan.

让古板超矮精度(平教不合辨率5000DPI以上)扫描仪或拍照制版也不克不及表现版纹的线条不离可以不攻扫描。

Keywords Accelerator;Nucleophilic reaction;Polymer film;Photolithography;

诱蚀剂;亲核反应;聚合物膜;光刻;

Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more.

课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。

These multidimensional structures with nano- and micrometer features that integrate photolithography, replica molding and physical self-assembly are useful in micro- and nanofabrication.

这种多尺度的复合结构将光刻技术、复制模铸和物理自组装等有效结合，广泛应用于微纳制造领域。

There has been a great interest in such structured films due to its potential applications in photolithography, near field microscopy and photonic devices.

这种结构的金属薄膜在光印刷、近场显微镜和光子器件等方面有着广泛的应用前景，近年来引起了人们的重视。

New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution

部分相干分数域滤波改善光刻分辨率新方法

Due to the diffracting limitation of the photolithography, imprint lithography technology, which maybe next generation lithography technology, is described.

针对微纳制造中光刻环节的光衍射限制,讨论了可能成为下一代光刻技术路线的压印光刻。

First, consider the advantages and disadvantages of photolithography.

首先，想想光蚀刻法的优点跟缺点。